Hafnium Sputtering Target, Hf

Hafnium sputtering target has the same properties as hafnium metal. Hafnium is named after Hafnia, the Latin name for Copenhagen, where it was discovered. “Hf” is the canonical chemical symbol of hafnium. Hafnium is a lustrous, silvery gray, tetravalent transition metal which chemically resembles zirconium.

Applications:

Hafnium sputtering targets can be sputtered elementally or reactively with a partial pressure of oxygen introduced in the working gas to produce hafnium oxide thin films. Resultant films are used in a variety of applications including optical coatings for photonics, thin film resistors, corrosion resistance, nuclear products, gate insulators in integrated circuits and for sensors.