Hafnium(IV) Oxide Evaporation Materials, HfO2

Hafnium(IV) oxide evaporation material is an oxide evaporation material with the chemical formula HfO2.  Hafnium Oxide has a density of 9.68 g/cc, a melting point of 2,758°C, and vapor pressure of 10-4 Torr at 2,500°C. It is off-white in color and generally considered to be one of the more stable hafnium compounds. Hafnium oxide has been utilized significantly in recent years as an addition to computer chips as a way to improve the speed and efficiency of processors. High purity hafnium(IV) oxide evaporation materials play a huge role in deposition processes to ensure high-quality deposited film.

Applications:

Hafnium(IV) oxide evaporation materials are used in the following applications:

• Used in deposition processes including semiconductor deposition, chemical vapor deposition (CVD) and physical vapor deposition (PVD)

• Used for optics including wear protection, decorative coatings, and displays.